超聲波清潔機(jī)的電流與電壓經(jīng)
瀏覽： 發(fā)布日期：2019-09-15
關(guān)于超聲波清洗機(jī)的電流與電壓設(shè)計(jì)以及頻率_濟(jì)南潔升超聲波清洗機(jī)
An object is made up of atoms and molecules. The atom consists of a nucleus (with a positive charge) and an electron (with a negative charge). The charge moves in one direction to form a current.
Although there is a lot of charge inside the object, not all charges can move freely. As long as a part of the outer electrons are weakly attracted by the nucleus, the metal atoms become free 超聲波清洗機(jī)electrons that can move in the metal. The current in the metal is the directional movement of these free electrons.
物體是由原子和分子構(gòu)成的，原子由原子核(帶正電荷)和電子(帶負(fù)電荷)構(gòu)成，電荷在物體內(nèi)向一個(gè)方向移動就構(gòu)成電流。
To generate current in a conductor, there is only a free electron, and there must be certain external conditions. In order for a continuous current to flow through the conductor, it is necessary to maintain a certain potential difference at both ends of the conductor (usually guaranteed by the power supply), and the potential difference is usually called voltage.
盡管物體內(nèi)部存在著很多電荷，但并不是一切電荷都能自在移動。金屬原子只要一部分外層電子受原子核的吸引力比較弱，而變成能夠在金屬中自有運(yùn)動的自在電子。金屬中的電流即是這些自在電子的定向移動構(gòu)成的。
Their physical connection is: the existence of free electrons is the internal cause of current, and voltage is the external cause of current.
要在導(dǎo)體內(nèi)發(fā)生電流，只存在自在電子還不可，還得有必定的外界條件。要使導(dǎo)體中有繼續(xù)電流流過，導(dǎo)體兩頭有必要堅(jiān)持必定的電位差(通常由電源來供給保證)，電位差通常稱為電壓。
The current and voltage of the ultrasonic cleaner are planned together to obtain ultrasonic waves, and then the object is cleaned. Ultrasonic cleaning machine is also, the frequency is low, the simpler the cavitation occurs, and the liquid is subjected to the tightening and rare action at a low frequency for a longer time distance, so that the bubble can grow to a larger size before the collapse, and the height is increased. The cavitation strength is good for cleaning.
他們的物理聯(lián)系是：自在電子的存在是構(gòu)成電流的內(nèi)因，電壓是構(gòu)成電流的外因。
Therefore, low-frequency ultrasonic cleaning is suitable for the appearance of large parts or the combination of dirt and cleaning parts. However, it is easy to corrode the appearance of the cleaning parts, and it is not suitable for cleaning the parts with high surface finish, and the cavitation noise is large. The frequency of 40KHZ swing, under the same sound intensity, the number of cavitation bubbles is more than the frequency of 20KHZ, the penetrating power is strong, it is better to clean the workpiece with disordered appearance or blind holes, the cavitation noise is small, but empty The strength is low, and it is suitable for the occasion where the cleaning dirt is weakly combined with the surface of the cleaning member. High-frequency ultrasonic cleaning is suitable for computer, precision cleaning of microelectronic components. ;MHz ultrasonic cleaning is suitable for cleaning integrated circuit chips, silicon wafers and wave films. It can remove micron and submicron dirt without any cleaning parts. damage.
超聲波清潔機(jī)的電流與電壓經(jīng)過共同規(guī)劃，才干得到超聲波，然后對物體進(jìn)行清潔。超聲波清潔機(jī)也即是，頻率低，空化越簡單發(fā)生，而且在低頻情況下液體遭到的緊縮和稀少作用有更長的時(shí)刻距離，使氣泡在潰散前能生長到較大的尺寸，增高空化強(qiáng)度，有利于清潔作用。
Therefore, from the cleaning effect and economic thinking, the frequency is usually selected in the 20\u0026mdash;130KHZ scale. Of course, the accurate selection of the frequency is very important, and the selection of the specific suitable working frequency needs to be obtained by certain tests. 所以低頻超聲清潔適用于大部件外表或者污物和清潔件外表結(jié)合度高的場合。但易腐蝕清潔件外表，不適宜清潔外表光潔度高的部件，而且空化噪音大。40KHZ擺布的頻率，在相同聲強(qiáng)下，發(fā)生的空化泡數(shù)量比頻率為20KHZ時(shí)多，穿透力較強(qiáng)，宜清潔外表形狀雜亂或有盲孔的工件，空化噪音較小，但空化強(qiáng)度較低，適宜清潔污物與被清潔件外表結(jié)合力較弱的場合。高頻超聲清潔適用于計(jì)算機(jī)，微電子元件的精密清潔;兆赫超聲清潔適用于集成電路芯片、硅片及波薄膜的清潔，能去除微米、亞微米級的污物而對清潔件沒有任何損害。
Although there is a lot of charge inside the object, not all charges can move freely. As long as a part of the outer electrons are weakly attracted by the nucleus, the metal atoms become free 超聲波清洗機(jī)electrons that can move in the metal. The current in the metal is the directional movement of these free electrons.
物體是由原子和分子構(gòu)成的，原子由原子核(帶正電荷)和電子(帶負(fù)電荷)構(gòu)成，電荷在物體內(nèi)向一個(gè)方向移動就構(gòu)成電流。
To generate current in a conductor, there is only a free electron, and there must be certain external conditions. In order for a continuous current to flow through the conductor, it is necessary to maintain a certain potential difference at both ends of the conductor (usually guaranteed by the power supply), and the potential difference is usually called voltage.
盡管物體內(nèi)部存在著很多電荷，但并不是一切電荷都能自在移動。金屬原子只要一部分外層電子受原子核的吸引力比較弱，而變成能夠在金屬中自有運(yùn)動的自在電子。金屬中的電流即是這些自在電子的定向移動構(gòu)成的。
Their physical connection is: the existence of free electrons is the internal cause of current, and voltage is the external cause of current.
要在導(dǎo)體內(nèi)發(fā)生電流，只存在自在電子還不可，還得有必定的外界條件。要使導(dǎo)體中有繼續(xù)電流流過，導(dǎo)體兩頭有必要堅(jiān)持必定的電位差(通常由電源來供給保證)，電位差通常稱為電壓。
The current and voltage of the ultrasonic cleaner are planned together to obtain ultrasonic waves, and then the object is cleaned. Ultrasonic cleaning machine is also, the frequency is low, the simpler the cavitation occurs, and the liquid is subjected to the tightening and rare action at a low frequency for a longer time distance, so that the bubble can grow to a larger size before the collapse, and the height is increased. The cavitation strength is good for cleaning.
他們的物理聯(lián)系是：自在電子的存在是構(gòu)成電流的內(nèi)因，電壓是構(gòu)成電流的外因。
Therefore, low-frequency ultrasonic cleaning is suitable for the appearance of large parts or the combination of dirt and cleaning parts. However, it is easy to corrode the appearance of the cleaning parts, and it is not suitable for cleaning the parts with high surface finish, and the cavitation noise is large. The frequency of 40KHZ swing, under the same sound intensity, the number of cavitation bubbles is more than the frequency of 20KHZ, the penetrating power is strong, it is better to clean the workpiece with disordered appearance or blind holes, the cavitation noise is small, but empty The strength is low, and it is suitable for the occasion where the cleaning dirt is weakly combined with the surface of the cleaning member. High-frequency ultrasonic cleaning is suitable for computer, precision cleaning of microelectronic components. ;MHz ultrasonic cleaning is suitable for cleaning integrated circuit chips, silicon wafers and wave films. It can remove micron and submicron dirt without any cleaning parts. damage.
超聲波清潔機(jī)的電流與電壓經(jīng)過共同規(guī)劃，才干得到超聲波，然后對物體進(jìn)行清潔。超聲波清潔機(jī)也即是，頻率低，空化越簡單發(fā)生，而且在低頻情況下液體遭到的緊縮和稀少作用有更長的時(shí)刻距離，使氣泡在潰散前能生長到較大的尺寸，增高空化強(qiáng)度，有利于清潔作用。
Therefore, from the cleaning effect and economic thinking, the frequency is usually selected in the 20\u0026mdash;130KHZ scale. Of course, the accurate selection of the frequency is very important, and the selection of the specific suitable working frequency needs to be obtained by certain tests. 所以低頻超聲清潔適用于大部件外表或者污物和清潔件外表結(jié)合度高的場合。但易腐蝕清潔件外表，不適宜清潔外表光潔度高的部件，而且空化噪音大。40KHZ擺布的頻率，在相同聲強(qiáng)下，發(fā)生的空化泡數(shù)量比頻率為20KHZ時(shí)多，穿透力較強(qiáng)，宜清潔外表形狀雜亂或有盲孔的工件，空化噪音較小，但空化強(qiáng)度較低，適宜清潔污物與被清潔件外表結(jié)合力較弱的場合。高頻超聲清潔適用于計(jì)算機(jī)，微電子元件的精密清潔;兆赫超聲清潔適用于集成電路芯片、硅片及波薄膜的清潔，能去除微米、亞微米級的污物而對清潔件沒有任何損害。
因此從清潔作用及經(jīng)濟(jì)性思考，頻率通常挑選在20—130KHZ規(guī)模，當(dāng)然準(zhǔn)確挑選頻率至關(guān)重要，而具體適宜的工作頻率的選擇需要做必定的試驗(yàn)獲得。
